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ALUMINUM NITRIDE SPUTTERING TARGETS
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ALUMINUM NITRIDE SPUTTERING TARGETS

ALUMINUM NITRIDE SPUTTERING TARGETS

Product Name: ALUMINUM NITRIDE SPUTTERING TARGETS

Product Name ALUMINUM NITRIDE SPUTTERING TARGETS
Product Code NCZ-VA-203/21
CAS No 24304-00-5
Particle Size inquire
Formula AlN 40.99
Form Sputtering Targets
Purity 99.5-99.9
Melting Point 2200oC / 3992oF
Density 3.26 G/cm3
Composition Al – 65.8 , N – 34.2
Crystal Structure Hex

Descriptions: ALUMINUM NITRIDE SPUTTERING TARGETS

NANOCHEMAZONE specializes in producing high purity Aluminium Nitride Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD) and physical vapour deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, bevelling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications.

Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). “Sputtering” allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment.

Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. NANOCHEMAZONE specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. NANOCHEMAZONE also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes.

Storage Conditions:

Airtight sealed, avoid light, and keep dry at room temperature. 

Please contact us for customization and price inquiry

Email: contact@nanochemazone.com

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.

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Description

Note: For pricing & ordering information, please contact us at info@chemazone.in
Please contact us for quotes on Larger Quantities & Customization. E-mail: contact@nanochemazone.com

Customization:

If you are planning to order large quantities for your industrial and academic needs, please note that customization of parameters (such as size, length, purity, functionalities, etc.) are available upon request.

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Category: Metal Oxide Powder
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Nanochemazone is a high-tech enterprise focusing on the research and development of Nanomaterials & Nanotechnology.

Aritech Chemazone Private Limited
Plot 890 Sector 7
Urban Estate Kurukshetra-136118 India
Phone: +91-9468182640
Email: sales@chemazone.in

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        • Graphdiyne
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      • Alloy Powder
      • Application Oriented Materials
      • Artificial Biological Solutions
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      • Core Shell Nano & Micro Structures
      • Dispersions Nano & Micro
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        • Screen Printed Electrode
        • Semiconductor Wafers
      • Foams, Foils & Nano Coatings
        • Metal Foils
        • Metal Foams
      • Graphene Nanostructures
        • CVD Graphene
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        • Graphene Quantum Dots
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      • Metal Powders and Salts
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